Leibniz Institute for Plasma Science and Technology
Felix-Hausdorff-Str. 2
17489 Greifswald
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The Leibniz Institute for Plasma Science and Technology (INP) is the largest non-university institute in the field of low temperature plasmas, their basics and technical applications in Europe. The institute carries out research and development from idea to prototype. The topics focus on the needs of the market. At present, plasmas for materials and energy as well as for environment and health are the focus of interest.

Dörte Valenthin
Patent Officer

Tel.: +49(0) 3834 554 3909
Fax: +49(0) 3834 554 301

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Disinfection process using an active disinfecting substance formed in situ by reacting H2O2 and NO2-

The invention relates to a disinfection process comprising the feed materials H2O2 and NO2 - and a mixing step and a distribution step, wherein the mixing step and the distribution step (during which each point on the surface being disinfected is wetted with a solution of active substance) are implemented during a processing period ZA. An exposure step follows, in which the distributed solution of active substance acts upon the surface in contact with the solution of active substance during an exposure period ZE. In this process, the maximum NO2 - concentration during the mixing step is of 300 mM, and the time-integrated reaction rate W is represented during the exposure period ZE by the integral formula (I), where k1 denotes the pH-value-dependent speed constant of the reaction between H2O2 and NO2 - and the pH value of the solution of active substance before it contacts the surface being disinfected lies in the range of 2.1 = pH < 6.8. The invention also relates to a device for providing the solution of active substance.

Figure 10 of the Patent Specification

Patent Info
Patent Family
Patent OfficePatent NumberFiledDate of PatentLegal Status
EPEP3781218A017.05.2019in force
USUS11,596,701 B218.11.202007.03.2023granted
CACA3099881A110.11.2020in force
BRBR112020023445117.11.2020in force
AUAU2019270515A106.11.2020in force
CNCN112118873A16.11.2020in force
JP2020-56465716.11.2020in force
KRKR20210010904A15.12.2020in force
HK62021030811.510.05.2021in force