INP

Leibniz Institute for Plasma Science and Technology
Felix-Hausdorff-Str. 2
17489 Greifswald
GERMANY

https://www.inp-greifswald.de/en/
welcomeatinp-greifswald [punkt] de

The Leibniz Institute for Plasma Science and Technology (INP) is the largest non-university institute in the field of low temperature plasmas, their basics and technical applications in Europe. The institute carries out research and development from idea to prototype. The topics focus on the needs of the market. At present, plasmas for materials and energy as well as for environment and health are the focus of interest.

Dörte Valenthin
Patent Officer

Tel.: +49(0) 3834 554 3909
Fax: +49(0) 3834 554 301

doerte [punkt] valenthinatinp-greifswald [punkt] de

Device for generating a cold atmospheric pressure plasma

The invention relates to a device for generating a cold atmospheric pressure plasma for treating human and/or animal surfaces, comprising a flat flexible multilayer system with a face which faces the surface to be treated and a face which faces away from the surface to be treated. The multilayer system comprises the following layers: namely a first electrode layer on the multilayer system face facing away from the surface to be treated, a second electrode layer on the multilayer system face facing the surface to be treated, said electrode layer having a plurality of recesses or being designed in a grid-like or meandering manner, a dielectricum layer which is arranged between the first electrode layer and the second electrode layer, and a spacer layer which is arranged adjacently to the second electrode layer on the multilayer system face facing the surface to be treated. The invention further relates to a cable, a generator unit for providing a high voltage, and a system.

Figure 2 of the Patent Specification

Patent Info
FieldValue
Patent Family
Patent OfficePatent NumberFiledDate of PatentLegal Status
DEDE102014220488A109.10.2014expired (granted in EP)
WOWO2016055654A109.10.2015--------------expired
EPEP3205186B109.10.201508.12.2021granted (in force in: AT, BE, CH, CZ, DE, DK, EE, ES, FI, FR, GB, IE, IT, LT, LU, LV, MC, MT, NL, NO, PL, PT, SE, SI, SK, TR)
USUS11,478,292B209.10.201525.10.2022granted
CA2,963,45709.10.201525.10.2022granted
BRBR112017007257-2 B109.10.201501.11.2022granted
AUAU2015329934B209.10.201503.06.2021granted
JPJP6718458B209.10.201516.06.2020granted
CNCN114390766 A09.10.2015in force
KRKR102500459 B109.10.201513.02.2023granted
EA00EA038650B109.10.201529.09.2021granted (in force in: RU)
MX38569909.10.201530.08.2021granted
SG11201702784S09.10.201514.02.2020granted
SA00SA8998B109.10.201503.12.2021granted
AEP6000399/201709.10.2015in force
HK1242906B09.10.201522.04.2022granted
ILIL251677A09.10.201501.09.2021granted
IN0049332709.10.201502.01.2024granted
ZA2017/0242409.10.201528.03.2018granted
MAMA40892B109.10.201528.02.2022granted
EA01EA040243 B109.10.201511.05.2022granted (in force in: RU)
IN0120231808084509.10.2015in force
Applicant(s)
Inventors
Device Info
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Plasma Source Name
Plasma Source Application
Plasma Source Specification