INP

Leibniz Institute for Plasma Science and Technology
Felix-Hausdorff-Str. 2
17489 Greifswald
GERMANY

https://www.inp-greifswald.de/en/
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The Leibniz Institute for Plasma Science and Technology (INP) is the largest non-university institute in the field of low temperature plasmas, their basics and technical applications in Europe. The institute carries out research and development from idea to prototype. The topics focus on the needs of the market. At present, plasmas for materials and energy as well as for environment and health are the focus of interest.

Dörte Valenthin
Patent Officer

Tel.: +49(0) 3834 554 3909
Fax: +49(0) 3834 554 301

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Modular Plasma Jet Treatment System

The invention relates to a modular plasma jet treatment system (1), particularly for therapeutic or oral applications, comprising a plasma source (2) with least the following components; a high-voltage module (20) comprising a high-voltage electrode (21) and first connection means, a plasma jet applicator (30) configured to generate at least one plasma jet (35), wherein the plasma jet applicator (30) comprises a cavity (31) for a process gas (100), wherein a ceiling portion (32) of the cavity (31) is either arranged on the plasma jet applicator (30) and/or on the high-voltage module (20), the cavity (31) comprising a process gas inlet (33) and at least one plasma jet outlet (34), wherein the plasma jet applicator (30) comprises a second connection means, wherein the first and second connection means are configured such that the plasma jet applicator (30) and the high-voltage module (20) are repeatedly connectable and releasable, wherein, when the plasma jet applicator (30) is connected to the high-voltage module (20), the cavity (31) is adjacently arranged with the ceiling portion (32) at the high-voltage module (20), and wherein the cavity (31) is separated by a dielectric (23, 47) from the high-voltage electrode (21) of the high-voltage module (20).

Figure 2 of the Patent Specification

Patent Info
FieldValue
Patent Family
Patent OfficePatent NumberFiledDate of PatentLegal Status
EPEP3474635B117.10.201718.08.2021expired
KRKR20190043091A11.10.2018expired
USUS11,032,898 B216.10.201808.06.2021granted
Applicant(s)
Inventors
Device Info
FieldValue
Plasma Source Application