INP

Leibniz Institute for Plasma Science and Technology
Felix-Hausdorff-Str. 2
17489 Greifswald
GERMANY

https://www.inp-greifswald.de/en/
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The Leibniz Institute for Plasma Science and Technology (INP) is the largest non-university institute in the field of low temperature plasmas, their basics and technical applications in Europe. The institute carries out research and development from idea to prototype. The topics focus on the needs of the market. At present, plasmas for materials and energy as well as for environment and health are the focus of interest.

Dörte Valenthin
Patent Officer

Tel.: +49(0) 3834 554 3909
Fax: +49(0) 3834 554 301

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Process for textile cleaning and disinfection by means of plasma and plasma lock

The invention relates to a process for textile cleaning and disinfection by means of plasma and plasma lock for inactivating viruses, bacteria and spores and also for purifying air in the conventional sense, such as to remove dust, pollen, odours or the like. The object of the invention is to develop a process for cleaning and disinfection of textiles and air to remove viruses, bacteria, spores and also for cleaning to remove dust, pollen, odours etc., in which the use of water and diverse cleaning agents and also disinfectants is not necessary, or can be significantly reduced. In the lock, living creatures must be able to be detained - likewise, individual items, textiles etc. must be able to be treated. In this case, airborne aerosols (droplets, particles, dust) and also aerosols or microbes ad-hering to the clothing or the body or the product must be able to be treated. The basic principle should also be generally applicable to rooms (e.g. waiting rooms) or animal housing and also under clean room conditions. According to the invention, cleaning of, e.g., odour-polluted clothing and also the sterilization of textiles proceeds on the basis of plasma processes. In this case, the following process steps are used: a) plasma generation, b) ozone generation and activation, c) sterilization, d) oxidation and destruction of gaseous components, e) separation of microbes and aerosols and f) destruction thereof.

Figure 7 of the Patent Specification
Figure 7 shows an arrangement formed as a lock.
1 = electrode systems; 2 = ultraviolet light source; 3 = orifice grid; 4 = piece-good; 5 = conveyor

Patent Info
FieldValue
Patent Family
Patent OfficePatent NumberFiledDate of PatentLegal Status
DEDE102007037984A110.08.2007----------------expired
WOWO2009/021919A208.08.2008----------------expired
JPJP5247803B225.02.201119.04.2013expired
EPEP2175892B108.08.200826.09.2012granted (active in Germany, Austria, Switzerland)
USUS9,119,892B210.02.201001.09.2015expired
Applicant(s)
Inventors
Device Info
FieldValue
Plasma Source Application