van Helden, Jean-Pierre

Evidence of the Dominant Production Mechanism of Ammonia in a Hydrogen Plasma with Parts Per Million of Nitrogen - Dataset

Absolute ground state atomic hydrogen densities were measured, by utilisation of two-photon absorption laser induced fluorescence (TALIF), in a low pressure electron cyclotron resonance plasma as a function of nitrogen admixtures - 0 to 5000 ppm. At nitrogen admixtures of 1500 ppm and higher the spectral distribution of the fluorescence changes from a single Gaussian to a double Gaussian distribution; this is due to a separate, nascent, contribution arising from the photolysis of an ammonia molecule.

Spatial distribution of HO₂ in an atmospheric pressure plasma jet investigated by cavity ring-down spectroscopy - dataset

The data set comprises full cavity ring-down spectra and absorption coefficients obtained from on-off-resonance measurements, in order to determine the spatial distribution of HO₂ in the cold atmospheric pressure plasma jet kINPen-sci. Therefore, the plasma jet was operated with 3 slm Ar and 3000 ppm water, and was equipped with a gas curtain of 5 slm O₂. To determine the effective absorption length, the HO₂ absorption was measured in radial direction. These radial fits had a Gaussian-like shape.

Ar metastable densities (³P₂) in the effluent of a filamentary atmospheric pressure plasma jet with humidified feed gas - dataset

The Ar(³P₂) metastable density in the effluent of the cold atmospheric pressure plasma jet kINPen-sci was investigated as a function of the feed gas humidity, the gas curtain composition, and the distance from the nozzle by means of laser atomic absorption spectroscopy. The data set comprises the axial distributions of the Ar metastables as a function of these parameters.

On the relationship between SiF4 plasma species and sample properties in ultra low-k etching processes

The temporal behavior of the molecular etching product SiF4 in fluorocarbon-based plasmas used for the dry etching of ultra low-k (ULK) materials has been brought into connection with the polymer deposition on the surface during plasma treatment within the scope of this work. For this purpose, the density of SiF4 has been measured time-resolved using quantum cascade laser absorption spectroscopy (QCLAS).