The invention relates to a method for the biological decontamination of material to be treated (4) by means of a reactive gas (R) comprising the generation of a reactive gas (R) from a process gas by igniting a plasma, filling a container (3) with the reactive gas (R) and the Decontamination of the material to be treated (4) in the container (3) by means of the reactive gas (R).
The invention further relates to a plasma ignition device (20) comprising an electrically conductive base plate (201) and at least two electrically conductive pins (202), the plasma ignition device (20) being designed to create an electric field between the pins (202) by resonance with microwaves to generate, wherein a plasma can be ignited by means of the electric field.
The invention also relates to a system (1) for the biological decontamination of items to be treated (4) by means of a reactive gas (R) with a container (3) for receiving items to be treated (4) and a plasma ignition device (20).

Figure 1 of the Patent Specification
EP3536348 A1
1. Method for the biological decontamination of material to be treated (4) by means of a reactive gas (R), comprising the steps:
• Generating a reactive gas (R) from a process gas by igniting a plasma, wherein the reactive gas (R) has a higher density than air at the same pressure and temperature,
• Filling a container (3) with the reactive gas (R) so that the container (3) is almost completely or at least partially filled with the reactive gas (R),
• Biological decontamination of the material to be treated (4) in the container (3) by means of the reactive gas (R).
11. Plasma ignition device (20) comprising an electrically conductive base plate (201) and at least two electrically conductive pins (202) electrically connected to the base plate (201),
characterized in that
the plasma ignition device (20) is designed to generate an electric field between the pins (202) by resonance with microwaves of a maximum power density of 0.05 to 1 MW/m2, wherein a plasma can be ignited by means of the electric field.
Field | Value | ||||||||||
---|---|---|---|---|---|---|---|---|---|---|---|
Patent Family |
| ||||||||||
Applicant(s) | |||||||||||
Inventors |
Field | Value |
---|---|
Plasma Source Application |