The invention relates to a device, to a system, and to a method for antimicrobial treatment during performance of operations in bodies, to a method for producing the device, and to a computer program. A device (11) is provided for antimicrobial treatment during performance of operations, in particular minimally invasive operations, in bodies. Said device comprises a main body (1) for partial introduction into a body and at least one plasma source (12) arranged in at least one portion of the main body (1). The plasma source (12) has at least one high-voltage electrode (9) which is covered at least partially and in particular completely with a dielectric (10) and is adapted to produce a plasma when an electric voltage is applied and in co-operation with a second electrode by means of dielectric barrier discharge.
Figures 1 and 2 of the Patent Specification
|Patent Family|| |
|Patent Office||Patent Number||Filed||Date of Patent||Legal Status |
|DE||DE102017105702A1||16.03.2017||in force |
|EP||EP3429640A1||16.03.2017||in force |
Patent Publications (external link):