INP

Leibniz Institute for Plasma Science and Technology
Felix-Hausdorff-Str. 2
17489 Greifswald
GERMANY

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The Leibniz Institute for Plasma Science and Technology (INP) is the largest non-university institute in the field of low temperature plasmas, their basics and technical applications in Europe. The institute carries out research and development from idea to prototype. The topics focus on the needs of the market. At present, plasmas for materials and energy as well as for environment and health are the focus of interest.

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Modelling studies of arcs of short length between copper electrodes: Dataset

Thermal Plasma Technology

The data correspond to the results of modelling studies of DC electric arcs at a current of 2 A in air with admixture of copper metal vapour. Experimental findings are used to adjust input parametrs of the model in order to achieve a good match. The simulations are performed strating with a discharge burning with a minimum gap length of 30 µm for a physical time of 11 ms. Then, the separation of the electrodes is followed for further 51 ms and the discharge gap is increased up to 3 mm. The comparision of experimental and modelling data is based on the measured arc voltage. Variations of the discharge radius during the contact opening, the field enhancement factor, and the molar fraction of copper metal vaopur show the sensitivity of the computed arc voltage.

non-equilibrium plasma
electric arcs
copper metal vapour
air
FieldValue
Group
INP
IEE
Authors
Baeva, Margarita
Ballentin, Jonas K. C.
Uhrlandt, Dirk
Release Date
2025-08-26
Identifier
92c2e1d1-e75b-4c53-ada1-70c2e496dfad
Permanent Identifier (DOI)
10.34711/inptdat.942
Permanent Identifier (URI)
https://www.inptdat.de/node/942
Is supplementing
10.14311/ppt.2025.1.40
Plasma Source Name
DC electric arc
Plasma Source Application
low-voltage switching
Plasma Source Specification
DC
atmospheric pressure
non-thermal
Plasma Source Properties

The electrode configuration under atmospheric pressure air conditions includes two cylindrical electrodes made of pure Cu with a diameter of 4 mm and a length of 12 mm, which are aligned on a common axis one electrode. One electrode is fixed while the other can be moved along the axis by means of a step motor.
Plasma Source Procedure

The arc ignites with the start of the contact separation. At a very small gap, the current is enforced to flow through tiny metal parts, which leads to their evaporation. The discharge gap is filled with copper metal vapour. With the further increase of the gischarge gap, the surrounding air is mixing with the metal vapour.
Plasma Medium Name
air-Cu
air
Cu vapour
Plasma Medium Properties

The presence of metal vapour changes significantly the plasma properties due to the low ionization energy of the Cu atoms. The electric conductivity of the plasma medium increases in comparison to pure air.
Plasma Medium Procedure

No specific gas treatment.
Plasma Target Name
copper
Cu
Plasma Target Properties
Melting and evaporation.
Plasma Target Procedure
Heat fluxes to the electrodes from the plasma can lead to melting and evaporation.
Plasma Diagnostics Name
voltage measurement
high-speed imaging
OES
Unified non-equilibrium model
Plasma Diagnostics Properties

The unified non-equilibrium fluid model in one dimension is used to explore the plasma parameters (model description is provided in doi:10.1088/1361-6463/ad9f79). The model solves the equations for conservation of species, energy of electrons and heavy particles (atoms, molecules, ions), the Poison equations for the electric potential, the heat transfer in the electrodes for a current level controlled by an external circuit.
Plasma Diagnostics Procedure

The simulations are performed strating with a discharge burning with a minimum gap length of 30 µm for a physical time of 11 ms. Then, the separation of the electrodes is followed for further 51 ms and the discharge gap is increased up to 3 mm. The comparision of experimental and modelling data is based on the measured arc voltage. Variations of the discharge radius during the contact opening, the field enhancement factor, and the molar fraction of copper metal vaopur show the sensitivity of the computed arc voltage.
Language
English
License
Creative Commons Attribution 4.0 International (CC BY 4.0)
Public Access Level
Public
Contact Name
Baeva, Margarita
Contact Email
baeva@inp-greifswald.de

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