The invention relates to a device, preferably a collar, for treating areas of human or animal skin or mucous membrane with a cold atmospheric pressure plasma by creating a dielectrically hindered surface discharge, comprising at least one...
The invention relates to a method and a series of devices for dry cleaning, activating, modifying, coating, and biologically decontaminating (degerming, disinfecting, sterilizing) surfaces by means of an atmospheric pressure plasma generated...
The dataset contains data from comparative studies of capacitively coupled radio-frequency (CCRF) discharges in helium and argon at pressures between 10 and 80 Pa applying two different fluid modeling approaches as well as two independently...
This dataset contains plasma parameters of microarcs generated between a cooled copper anode and a ceriated tungsten cathode by means of a one-dimensional unified non-equilibrium model for gap lengths between 15 and 200 µm and current densities...
The data set comprises the spatial distributions of H and O atoms in the cold atmospheric pressure plasma jet kINPen-sci. The data was obtained by means of picosecond two-photon absorption laser induced fluorescence spectroscopy (ps-TALIF) and...
The relation between the voltage and the arc length in gas metal arc welding (GMAW) is an important characteristic. It depends on a complex distribution of the electric conductivity along the current path and does not depend on the arc length...
Recent research of gas metal arc welding (GMAW) has proven that the sheath voltage dominates the total voltage fall in the current circuit and delivers most of the energy, which is finally transferred to the wire and the weld pool. This data set...
The self-organized behaviour (locked mode) of filaments in the non-thermal atmospheric pressure plasma jet (ntAPPJ) couples a spatial patterning of the discharge (helical symmetry) and a regular motion (steady rotation). The dataset represents...
The temporal behavior of the molecular etching product SiF4 in fluorocarbon-based plasmas used for the dry etching of ultra low-k (ULK) materials has been brought into connection with the polymer deposition on the surface during plasma treatment...
The provided data describe the discharge current in DBD obtained by fluid modelling using different values of for the secondary electron emission coefficient γ and and the relative permittivity of the dielectric barrier εr in comparison with the...