Leibniz Institute for Plasma Science and Technology
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The Leibniz Institute for Plasma Science and Technology (INP) is the largest non-university institute in the field of low temperature plasmas, their basics and technical applications in Europe. The institute carries out research and development from idea to prototype. The topics focus on the needs of the market. At present, plasmas for materials and energy as well as for environment and health are the focus of interest.

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Upscaling from single- to multi-filament dielectric barrier discharges in pulsed operation - Dataset

A study on the scalability of discharge characteristics of a single-filament dielectric barrier discharge (DBD) to a spatially one-dimensional multi-filament arrangement driven by the same high-voltage (HV) pulses was performed for a gas mixture of 0.1 vol% O2 in N2 at 1 bar. Both arrangements feature a 1 mm gap with dielectric-covered electrodes featuring two hemispherical alumina caps for the single-filament and two parallel alumina-tubes for the multi-filament arrangement. The DBDs were characterised by electrical measurements (for peak current, energy, and power) accompanied by iCCD and streak imaging to determine the filament number and the discharge development in the gas gap and on the surfaces. The dataset contains the data presented in the corresponding journal article.

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Plasma Source Name
Plasma Source Application
Plasma Source Specification
Plasma Source Properties

Two different arrangements were used. The single-filament DBD was ignited in a Plexiglas cell with quartz windows. It holds two hemispherical alumina-covered electrodes with 2 mm radius featuring a 1 mm gas gap and 0.5 mm dielectric thickness at the tips.

The multi-filament arrangement with was positioned in a pumpable stainless steel chamber with a quartz window at the front, gas inlet on the top, gas outlet at the bottom. To exclude any impact of the dielectric material on the comparison between the single- and the multi-filament DBDs, the same alumina tubes (manufacturer Friatec) were used for both arrangements. The multi-filament arrangement with 1 mm gas gap consists of two parallel alumina cylinders with 4 mm outer and 2 mm inner diameter with metal rods of 2 mm diameter inside. The thickness of the dielectric in the gap d_b is 1 mm on each electrode. The lateral length of the 1 mm gas gap is about 10 mm with an increasing gas gap distance at the left and right end due to the hemispherically-shaped tips.

Plasma Source Procedure
Unipolar square wave pulses with 10kV amplitude and 10 kHz repetition frequency generated by a HV pulse source (DEIPVX-4110, 50 ns rise/fall time(10%–90%) of HV slope) were used to operate the DBDs in both arrangements. The HV pulse width t pulse was varied from 0.2 to 50 µs.
Plasma Medium Name
Plasma Medium Properties

A gas mixture of 0.1 vol% O2 (purity 4.8) in N2 (purity 5.0) at a pressure of p = 1 bar was used for all experiments.

Plasma Medium Procedure

The total gas flow through the cell was set to 100 sccm for the single-filament arrangement and to 300 sccm for the multi-filament arrangement by mass flow controllers connected to gas cylinders. The O2 concentration was controlled by an oxygen sensor (ZIROX SGM 7.4) for both arrangements during the experiments.

Plasma Diagnostics Name
Plasma Diagnostics Properties

Voltage probe: Tektronix P6015A; current probe: custom-build 50 Ω resistor according to; digital sampling oscilloscope: Tektronix DPO 7254C, 2.5GHz, 40GS/s); iCCD camera: Andor iStar DH734-18U-A3, 2 ns maximal temporal resolution; streak camera: Hamamatsu C5680-21C, 20 ps maximal temporal resolution

Plasma Diagnostics Procedure

Optical diagnostics were performed with a fast iCCD camera and a streak camera system connected to a long-distance microscope. The spatial resolution of both cameras was approximately 2 µm for the single filament arrangement and approximately 20 µm for the multi-filament arrangement to allow the visualisation of the complete discharge gap (using a B. Halle Nachfl. OUV 1.4.40 UV achromat).

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Contact Name
Höft, Hans
Contact Email

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